LKJ-1D-100 Ion Beam Milling System ionize possess high-quality ion source, which is the advantageous technique of Beijing institute of advanced ion beam technology. This system ionize Ar atom to Ar+ because of glow discharge in the cavity of ion source. Right after ionization, Ar+ is ejected and accelerated by grid electrode, and finally bombard the surface of sample physically. The atoms of sample are splashed away, resulting physical etching.
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The RTP-600xp System is an Advanced Bench Top Rapid Thermal Processing System with Multi-Gas Capabilities for Si, Ge, Si/Ge, GaAs, InP, and other semiconductor materials. Applications include Rapid Thermal Alloying, Annealing, Implant Activation, Oxidation and Reflow, just to name a few.
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